Numerical Technologies is trying to take its phase-shift mask technology out of just making shorter gates and into the interconnect layers of chips as the chipmakers try to push 193nm equipment deeper ...
SAN JOSE, Calif. — Actinix Inc. has been awarded a Phase II grant from the National Science Foundation (NSF) to complete the development of its phase-shift metrology system for advanced photomasks ...
With this one-of-kind tool, we can now fully characterize the phase shift properties of EUV masks and materials.” — Dr. Patrick Naulleau MARTINEZ, CALIFORNIA ...
The semiconductor industry is moving full speed ahead to develop high-NA EUV, but bringing up this next generation lithography system and the associated infrastructure remains a monumental and ...
Experts at the Table: Semiconductor Engineering sat down to discuss optical and EUV photomasks issues, as well as the challenges facing the mask business, with Naoya Hayashi, research fellow at DNP; ...
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